Study of SILYAL Process for 157-nm Lithography.

Single Layer Fluoropolymer Resists for 157 nm Lithography

We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of 1) tetrafluoroethylene (TFE), 2) a norbornene fluoroalcohol (NBFOH), and 3) t-butyl acrylate (t-BA). TFE incorporation reduces optical absorbance at 157 nm, while the presence of a norbornene functionalized with hexafluoroisopropanol groups contributes to aqueous base (developer) solubility and e...

Bottom Anti-Reflective Coatings (BARCs) for 157-nm!Lithography

Bottom anti-reflective coatings (BARCs) are essential for achieving the 65-nm node resolution target by minimizing the substrate reflectivity to less than 1% and by planarizing substrates. We believe that the developments in 157-nm BARC products are on track to make them available for timely application in 157-nm lithography. We have made some significant improvements in resist compatibility an...

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography The aqueous base development step is one of the most critical processes in modern lithographic imaging technology. Sinusoidal modulation of the exposing light intensity must be converted to a step function in the resist film during the development process. Thus, in designing high-performance resi...

Materials for Advanced Microlithography: Polymers for 157 Nm Lithography and Acid Diffusion Measurements

Optimizing polymers to increase pellicle lifetime and transmission for 157-nm lithography

The introduction of the 157-nm wavelength for next-generation optical lithography has created a need for new soft (polymeric) or hard (quartz) pellicle materials optimized for that wavelength. The design and development of ultratransparent fluoropolymers suitable for 157-nm soft-pellicle applications has produced several promising candidate materials with absorbances <0.03/μm to achieve pellicl...